The method of change (or anomaly) detection in high-dimensional discrete-time processes using a multivariate Hotelling chart is presented. We use normal random projections as a method of dimensionality reduction. We indicate diagnostic properties of the Hotelling control chart applied to data projected onto a random subspace of R. We examine the random projection method using artificial noisy i...

The method of change (or anomaly) detection in high-dimensional discrete-time processes using a multivariate Hotelling chart is presented. We use normal random projections as a method of dimensionality reduction. We indicate diagnostic properties of the Hotelling control chart applied to data projected onto a random subspace of R. We examine the random projection method using artificial noisy i...

Adaptive sample size and sampling intervals schemes have been widely used to improve the statistical efficiency of Hotelling T control chart in detecting small changes when the quality of a product or a process can be characterised by the multivariate distribution of quality characteristics. In this paper, we design a Hotelling T scheme varying sample sizes and sampling intervals (VSSI-T) for a...

When monitoring a process which has multivariate normal variables, the Shewhart-type control chart (Hotelling (1947)) traditionally used for monitoring the process mean vector is effective for detecting large shifts, but for detecting small shifts it is more effective to use the multivariate exponentially weighted moving average (MEWMA) control chart proposed by Lowry et al. (1992). It has been...

Multivariate statistical process control deserves particular attention in the recent scenario. Though, Hotelling control chart is quite popular and widely used technique in this field but its performance is deteriorated when the underlying distribution of the quality characteristics is not following multivariate normal distribution. Hence the need of developing a non-parametric multivariate con...

Endpoint detection is very important undertaking on the side of getting a good understanding and figuring out if a plasma etching process is done in the right way, especially if the etched area is very small (0.1%). It truly is a crucial part of supplying repeatable effects in every single wafer. When the film being etched has been completely cleared, the endpoint is reached. To ensure the desi...